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ʻO nā maka lapaʻau i hoʻopau ʻia me ka ethylene oxide
ʻO nā maka lapaʻau lapaʻau he mau masks hiki ke hoʻohana ʻia e nā limahana lapaʻau i ka wā o nā hana invasive, hiki ke uhi i ka waha a me ka ihu o ka mea hoʻohana a hāʻawi i kahi pale kino e pale aku ai i ke komo pololei ʻana o nā pathogens, microorganisms, nā wai kino a me nā ʻāpana.
Hana ʻia nā masks lapaʻau i ka polypropylene.Hoʻonui kēia mau fiber superfine me ke ʻano capillary kū hoʻokahi i ka helu a me ka ʻili o nā fibers i kēlā me kēia ʻāpana, no laila e hana ai i nā lole hehee i loaʻa ka kānana maikaʻi a me nā waiwai pale.
palapala hōʻoia:CE FDA ASTM F2100-19
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Palekana Palekana Lapaau Maka
Hoʻokumu ʻia ka maka lapaʻau i ke kino maka o ka mask a me ke kāʻei hoʻopaʻapaʻa.Hoʻokaʻawale ʻia ke kino o ka maka o ka mask i ʻekolu mau papa: ʻo ka ʻaoʻao o loko he mea ʻili maikaʻi (ka gauze maʻemaʻe a i ʻole ka lole i ulana ʻole ʻia), ʻo ka papa waena he papa kānana kaʻawale (ultra-fine polypropylene fiber melt-blown material layer. ), a ʻo ka ʻaoʻao o waho he mea antibacterial layer kūikawā (ka lole ʻaʻole i ulana ʻia a i ʻole ka polypropylene melt-blown material layer ultra-thin).
palapala hōʻoia:CE FDA ASTM F2100-19
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FFP2, FFP3 (CEEN149:2001)
ʻO nā māka FFP2 e pili ana i nā masks e kū ana i nā kūlana ʻEulopa (CEEN 149: 2001).Hoʻokaʻawale ʻia nā kūlana ʻEulopa no nā masks pale i ʻekolu pae: FFP1, FFP2 a me FFP3
palapala hōʻoia:CE FDA EN149:2001+A1:2009
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4ply Non Woven Faric Disposable KF94 Facemask Me nā Loop pepeiao hiki ke hoʻololi.
ʻO ka mask KF94 kahi maʻamau i hana ʻia e ka hana Korea, a ua ʻike ʻia no kāna mau kānana ʻokoʻa.Ma lalo o kēia maʻamau, ʻoi aku ka nui o ka kānana o ka mask ma luna o 94% no nā ʻāpana me ke anawaena o 0.4 μm.
Ma ka hoʻohana ʻana i ka mask KF94, hiki iā ʻoe ke hōʻemi i ka pilikia o ka hoʻopili pololei ʻana i nā droplets i loaʻa nā mea ʻino.Hoʻokumu ka mask i kahi pale kino e pale ai i kēia mau droplets mai ka hoʻopili ʻana me kāu ʻōpū hanu.ʻO kēia ka hopena e kōkua i ka hōʻemi ʻana i nā manawa o nā maʻi a me ka hoʻolaha ʻana o nā maʻi.